Purpose of the development: The application of multilayer or multicomponent metallic and dielectric layers, including the formation of nanostructured catalyst layers (Fe, Ni, Co, etc.). Holding unit provides various film deposition processes to a thickness of 0.1-5 mm diameter 60-200 mm, the substrate, as well as square or rectangular with linear dimensions 30-200 mm.

Recommended application field: nanotechnology

Technical characteristic: The deposition rate: - Metal films ..................... 0.5 micron / min; - Dielectric films ................... 0.2 m / min. Non-uniformity of the films in thickness (150 mm diameter substrate) ....... ± 3%. The substrate temperature ....................... 300 ° C.

The development stage readiness: Ready for application

Description of the development:
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The unit has four operating positions: - Gatewaying and heating. - Ionic surface cleaning substrates. - Magnetron sputtering target material of the three small diameter. - Magnetron sputtering material from a target of large diameter. Features:  - Planar magnetron sputtering device with a target diameter of 280 mm or multikatodnoe targets with a diameter of 100 mm. - HF-cleaning substrates before application layers. - Airlock loading - unloading of wafers up to 200 mm (200x200 mm). - Oil-free pumping system (turbo-molecular or cryogenic, backing pumps). - Microprocessor control system. - Can be integrated into a "clean" room. - Ability to join in the cluster complex - docking of individual plants through the airlock, or with the platform freight load module. The design provides multiple modes of operation of magnetrons: - Training targets (surface cleaning) - Deposition of multilayer films - Deposition of multicomponent (three or two-component) of the films - Spray one-component films The vacuum system installation is made entirely on the basis of oil-free pumping equipment using imported turbo (cryogenic) and backing (dry) pumps. The gas system has a plurality of channels, the supply of inert and active gases with flow control of each of them (for reactive processes of the films). In addition to the gaseous medium in the chamber before and during the film deposition unit is equipped with a quadrupole mass spectrometer with an exhaust system of an individual. To control the plant uses imported industrial controller and a personal computer. The software allows you to monitor all process and machine parameters and diagnose deviations from them (the base of the current data characterizing the stability of the installation). For visual monitoring information is displayed.

corresponds technical description
Ready for implementation

Possibility of transfer abroad:
Licence's sale
Realization of finished commodity
Joint production, sale, exploitation

Photo

Country Russia

For additional information turn to:
E-mail: gal@uintei.kiev.ua