DEVICES FOR THE LOCAL PROCESSING OF SURFACES LIQUID REAGENTS
Technical characteristic:
Specifications:
- Maximum size of the lining with
studied film 160x160 mm;
- The diameter of the etching area of 3 mm;
- Temperature range 293 - 353 K;
- The minimum amount of etching 20 ml;
- Wavelength zonduyuchogo beam 0.63. and 0.83 microns;
- A range of angles of incidence of the probe
Beam 0-65 °;
- The drying of the sample after etching ~ 60 sec.
The development stage readiness:
Introduced in production
Description of the development: () Features: study etching processes in three modes - Static and dynamic circulation and recycling herbalist, to study the dependence of etching rate of films on the concentration, temperature and flow rate herbalist, an optical film thickness measurement directly in the etching process at two wavelengths of the laser beam and the study of contrasting herbalists and polishing properties, the study of the variation of the etch rate and refractive index of the films from the irradiation parameters, investigation of the buffer properties herbalists.
Possibility of transfer abroad:
Licence's sale Realization of finished commodity