Purpose of the development: Manufacture of clothes screening from intensive electromagnetic fields (microwaves, ultrahigh frequencies).

Recommended application field: The cloth is intended for protection of the personnel operating broadcasting radio centers, radio stations, television transmitters, cellular and satellite communication systems, radar installations, microwave equipment for various applications. The material can be used to manufacture articles ensuring local protection of the man, i.e. protective overalls, aprons, gloves, special curtains for physiotherapeutic rooms of medical institutions.

Advantages over analogues: Use of the developed fabric prolongs service life of protective clothes with their protective properties retained. Manufacture of the screening fabrics is carried out using domestic equipment, and their cost is much lower than of those produced abroad.

The development stage readiness: Introduced in production

Description of the development:
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The fabric is manufactured from polyester complex fibers and cotton yarn. The fabric contains reinforced current-carrying filament. The combination of synthetic and cotton fibers provides high physicomechanical parameters and good hygienic properties. The introduction of current-carrying filament reduces the value of specific surface electrical resistance of the fabric. The fabric has the highest efficiency if the step of current-carrying filament is 0.8?0.8 mm: on frequency of 1.2 GHz the fabric weakens electromagnetic radiation 2,500 times; on frequency of 3 GHz 1,000 times; on frequency of 12 GHz 50 times; on frequency of 36 GHz 10 times. The screening effect of protective clothes is achieved by providing complete shielding of the worker, by electrical conductance of the seams and tight fit of all metallized layers. The RF patent № 2229544 has been taken out.

Information about newness of the development:
there are Ukrainian patents -- 1 items

Possibility of transfer abroad:
Licence's sale
Realization of finished commodity

Photo

Country Russia

For additional information turn to:
E-mail: gal@uintei.kiev.ua