Purpose of the development: The development, which became known as VDS process is designed to spray protective coatings on various surfaces.

Recommended application field: Technology can be used for spraying in a controlled gas atmosphere or air.

Advantages over analogues: Compared with traditional methods of deposition, VDS process provides: - High applying a wide range of materials for all kinds of substrates; - No need to use binders with preservation unmatched adhesion coating; - Preparation of a wide range of coating thickness gage with a minimum measure; - Creation of nanostructured thin films of high degree of homogeneity and minimal surface defects; - Low cost of production.

The development stage readiness: tested in laboratory condition

Description of the development:
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The main feature of the VDS technology is that the coating material is a simultaneous increase in two factors: the amount of material that is transferred from the evaporator to the substrate and the amount of material that is deposited on the substrate. It provides a highly dense or porous ceramic and metal coatings for a given thickness of metal (ceramic) substrates. Deposition rate is 100-1000 times greater than existing vacuum PVD, CVD technology and 10 times more than in the plasma and "koating" technology application materials.

Possibility of transfer abroad:
Licence's sale
Combinated reduction to industrial level
Joint production, sale, exploitation

Photo

Country Ukraine

For additional information turn to:
E-mail: gal@uintei.kiev.ua