Purpose of the development: Designed to control electromagnetic radiation (monochromatic, focus, polarization) in the wavelength range of 0.5-50 nm.

Recommended application field: The projection X-ray lithography, X-ray analysis of light chemical elements (from Be to Mg), astrophysics, X-ray microscopy, plasma diagnostics.

Technical characteristic: - Reflectance - to 70%; - Spectral resolution - up to 10-2; - Size - up to 80 mm in diameter; - Heat resistance - up to 10000S; - Are made of flat and curved substrates.

The development stage readiness: Introduced in production

corresponds technical description
Conforms to technical characteristic

Possibility of transfer abroad:
Licence's sale
Licence's sale
Technological document's sale
Realization of finished commodity

Photo

Country Ukraine

For additional information turn to:
E-mail: gal@uintei.kiev.ua