Purpose of the development: Purpose: - Printing on paper and textile materials in the printing industry;; - Production of packaging for the food industry; - Manufacturing anilox wide range of diameters and lengths.

Recommended application field: Printing industry. Food industry.

Technical characteristic: Main technical characteristics: System Magnetron ion cleaning system The energy of 300 - 2000 EV activating gas of nitrogen, oxygen Working gas argon working gas argon Pressure (6 - 12) x 10-4 Torr pressure (2 - 8) x 10-3 Torr Diameter 10 - 40 mm Sputtering TiN rate 0,6 nm / s

The development stage readiness: Ready for application

Description of the development:
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Developed plasma technology is a common process , which consists of ion cleaning , polishing and coating technology anilox . This technology increases the adhesion surface anilox and prevents its contamination . Deposition binary chemical compounds ( nitrides, oxides and carbides ) increases the strength and corrosion resistance of the anilox layer and increases water resistance . The special design of the vacuum chamber permits anilox roller moving from the heating zone into a zone of plasma purification , and then in the zone of application, where the rotation of the cylindrical magnetron generates coating.

corresponds technical description
Ready for implementation

Possibility of transfer abroad:
Licence's sale
Licence's sale
Technological document's sale
Creation of joint enterprise

Photo

Country Ukraine

For additional information turn to:
E-mail: gal@uintei.kiev.ua