LASER SYSTEM FOR MICROMACHINING OF TRANSPARENT MATERIALS USING A LASER-INDUCED PLASMA
Purpose of the development:
Allows you to perform precision micromachining, particularly mikromarkirovku transparent materials using cheap and reliable neodymium laser wavelength of 1.06 or 0.53 mm, which corresponds to the transparency of these materials. The energy of the laser radiation transmitted through the material in the intermediate plasma phase.
Recommended application field:
Application:
- Micro-electronic and optical products;
- Laser production of souvenirs;
- Outdoor advertising.
Technical characteristic:
Main technical characteristics:
The size of the treatment zone to 2 x 2 mm
The laser wavelength of 1.06 or 0.53 pm
Time marking 15 cm
Materials Glass, fused quartz, sapphire, and other transparent materials
Depth markings 5 - 200 microns
Resolution of 10 microns
Power consumption of 200 W
The development stage readiness:
Ready for application
Description of the development:
() The laser beam passes through the transparent sample, beyond which is an opaque elastic target. In the narrow space between the sample and the target plasma is formed, which causes the primary stage of micro-etching of transparent targets.
corresponds technical description
Ready for implementation
Possibility of transfer abroad:
Licence's sale Technological document's sale Creation of joint enterprise
Photo
Country
Ukraine
For additional information turn to: E-mail: gal@uintei.kiev.ua
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