MANUFACTURING TECHNOLOGY FOR LIGHT EMITTING SILICON NANOSTRUCTURES
Purpose of the development:
Technology allows highly efficient light-emitting structures on large area substrates with a given spectral composition of radiation (from 560Nm to 950 nm).
Recommended application field:
Silicon photonics, in particular for the creation of silicon LED display emissive structures, the optical amplification and laser.
The development stage readiness:
Ready for application
Description of the development:
() Developed technology of light-emitting structures based on silicon nanocrystals in a porous oxide matrix with controlled nanocrystals. The technology is patented, the patent of Ukraine № 75793 for the invention "Method of light-emitting material based on silicon", publ. in the bulletin. "Industrial Property", № 5 dated 15.05.2006.
Information about newness of the development:
there are Ukrainian patents -- 1 items
corresponds technical description
Ready for implementation
Possibility of transfer abroad:
Licence's sale Technological document's sale
Photo
Country
Ukraine
For additional information turn to: E-mail: gal@uintei.kiev.ua
|