Purpose of the development: Compact reactor ion-plasma treatment of micro-and nanostructures "Titan-2" is designed for reactive plasma processing of micro-and nanostructures in microelectronics, for deposition of thin films, as well as for basic research in the field of gas discharge physics.

Recommended application field: Results of the development can be realized in research institutions and the physical and technical profile directly to enterprises producing modern high-tech products.

Technical characteristic: 1. The pressure in the processing zone: 1-500 Pas. 2. The diameter of the treatment area, at least 100 mm. 3. Heterogeneity etching diameter 100 mm, max: ± 2%. 4. Working with reactive radicals: CnFm, O2, N2, etc. 5. Control ion energy range: 20-500 eV. 6. Dimensions (without vacuum pump) 500x500x300 mm. 7. RF power: Rated: 100 W; Maximum: 300W.

The development stage readiness: Pre-production model is made

Description of the development:
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Device " Titan- 2" is a compact , low-power , table setting with RF diode reactor with distributed feeding and pumping gas for plasma-chemical etching processes with high uniformity . Device "Titan 2" provides the generation of charged particles and reactive radicals onto the surface of 100 mm diameter with the heterogeneity of less than 2% and the ability to control ion energy in the range of 20-500 eV. By using reactor " Titanium -2 " was reached etch rate of silicon of about 3 microns / min. Reactor adapted to long-term operation with reactive gases that contain fluorine, which makes it very attractive for etching semiconductor and dielectric surfaces. Compact design of the device allows you to use it as a table-top unit . Discharge chamber , RF generator , a matching device and the discharge chamber , and gas puffing system distributed microprocessor system measurement and control integrated into one unit . Device " Titan-2 " manufactured using components from leading manufacturers.

corresponds technical description
Conforms to technical characteristic

Possibility of transfer abroad:
Licence's sale
Creation of joint enterprise

Photo

Country Ukraine

For additional information turn to:
E-mail: gal@uintei.kiev.ua