Purpose of the development: Developed cluster system designed for the synthesis of layered functional, including nanocomposite structures and coatings, in particular coatings of oxides and oxynitrides type.

Recommended application field: Micro-and nanotechnology.

Advantages over analogues: The main advantage of the treatment as compared to foreign counterparts is that the synthesis is carried out in a range covering low working gas pressure ( 0.5-2 mTorr ) . Firstly, it allows to increase the distance to the magnetron surface 30-40 cm, significantly increase the surface area and improve coating application speed . Second, it allows for the activation of reactive gas RF inductive discharge and deliver the activated particles to coating synthesis . Third, it provides an opportunity to do bombardment of the surface of high- , medium-, or low energy .

The development stage readiness: Pre-production model is made

Description of the development:
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Developed cluster system combines a unique set of ion-plasma surface treatment instruments . The basic idea of the technology is the separation of two processes: sputtering a metal target using a DC magnetron in an inert gas and a reactive gas activation with additional plasma source based on the RF inductive discharge . The principal novelty of this cluster system is a combination of several sources of compatible flows metal ions , reactive particles for complex effects on the kinetics of growth of nanostructures . In particular, in the system for the first time such technology employs a unique bipolar source of charged particles , which provides simultaneous extraction of ions and electrons , eliminates the use of additional catalyst , even when processing dielectric targets . Authoring were protected by two patents of Ukraine . Thus, the developed cluster system enables the development of fundamentally new technologies for the synthesis of coatings with controlled properties . In particular, a series of experiments by reactive ion- beam processing of dielectric and semiconductor nanostructures constructed using source ( working gas CF4), which demonstrated the feasibility of processing anisotropic structures with a size of less than 70 nm.

Information about newness of the development:
there are Ukrainian patents -- 2 items

corresponds technical description
Guarantees stable results getting

Possibility of transfer abroad:
Licence's sale
Licence's sale

Photo

Country Ukraine

For additional information turn to:
E-mail: gal@uintei.kiev.ua