Purpose of the development: Optical and laser lithography, holography, the production of diffractive optical elements (diffraction gratings, Fresnel lenses and matrices), nano-optical devices (subhvolnovyh gratings with a period of up to 100 nm), optical discs, and the original rainbow holograms. These photoresists important characteristic of the refractive index (2.3-3, and sometimes higher), they are stable and do not require any thermal treatment, transparent in the infrared (IR) spectral range (from 600 nm up to 12-15 microns). Such features allow the use of chalcogenide photoresists for making efficient gratings IR microlens arrays, microlenses for optical fibers in conjunction with two- and three rozmennyh photonic crystals.

Recommended application field: In photolithography, holography, in the production of diffractive optical elements.

Technical characteristic: - resolution - Native resolution chalcogenides layers - 1 nm; - sensitivity - ultraviolet, visible, near-IR, electron and ion flows;. The value of sensitivity: - when recording holograms and photolithography - 5-50 cm2 / J; - in laser lithography - up to 300 cm2 / J; - method of applying - thermal evaporation under vacuum; - post-exposure treatment - liquid etching.

Advantages over analogues: Compared with existing analogues developed photoresist characterized chalcogenide thermal resistance (400 ° C), the absence of shrinkage during post-exposure processing, mechanical strength and chemical resistance. Workability use inorganic chalcogenide photoresists as chalcogenide film may be deposited as a very uniform thickness, and composition and may be used in the same processes and functional layers in microelectronics.

The development stage readiness: Ready for application

Description of the development:
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Proposed photoresists inorganic thin films of chalcogenide glass, deposited on the substrate by thermal evaporation under vacuum. It is known that the physical and chemical properties of these layers may vary under the action of light or electron beams. Using the developed selective herbalists, it turns out positive or negative resistance effect: the dissolution rate of the exposed photoresist is significantly higher or lower than the unexposed. Chalcogenide photoresists can be applied both to flat substrates, and to articles of complex shape. Research photostimulated transformation mechanisms allowed the development of thin-film photosensitive medium with unique characteristics. processes using these inorganic photoresist in photolithography, in the production of diffractive optical elements (diffraction gratings, fresnel lenses and matrices), in holography (recording-relief phase holograms) have also been developed for direct mastering of optical discs.

Information about newness of the development:
there are Ukrainian patents -- 1 items

corresponds technical description
Ready for implementation

Possibility of transfer abroad:
Licence's sale
Licence's sale
Technological document's sale
Combinated reduction to industrial level

Photo

Country Ukraine

For additional information turn to:
E-mail: gal@uintei.kiev.ua