Purpose of the development: Designed to improve the wear resistance of holographic embossing matrices working with them holographic products, increase productivity embossing process, reducing the cost of holographic products.

Recommended application field: Holography, design and construction of electronic devices and electronic equipment, surface finishing and coating.

Advantages over analogues: Analogs developed a process is not revealed. The cost of applying a wear-resistant protective coating does not exceed 8-10% of the cost of operating the holographic matrix by increasing its durability factor of ~ 2. Protective coating process does not degrade the ecological situation of the environment.

The development stage readiness: Introduced in production

Technical and economic effect: Reducing the cost of holographic products.

Description of the development:
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Increased wear resistance of working matrices based on protecting their holographic microrelief finest superhard coating of diamond-like carbon , not distorting the diffraction efficiency of holographic products . The thickness of the carbon protective coating not exceeding 100 nm. The required thickness of the coating is given by the process parameters. The protected surface working matrices protective coating is applied by plasma deposition. Manufacturing process may be implemented on serial vacuum systems to their minimum modification to the requirements of the process. Developers process is implemented using a vacuum plant UVN - 71P -3 after appropriate modernization . Manufacturing process may be adapted to increase the wear resistance of rubbing parts , reducing the coefficient of friction between them , increase their useful life . A pilot batch working holographic matrices with modified surface . Introduced a process of manufacturing workers modified matrices.

Possibility of transfer abroad:
Licence's sale
Technological document's sale

Photo

Country Belarus

For additional information turn to:
E-mail: gal@uintei.kiev.ua